Skip to content

Resist Enhancements for Sensitivity and Resolution

Photoresist layer manufacturing for use in a semiconductor component using a generated electric field

Published: 6th October 2022
Resist Enhancements for Sensitivity and Resolution
Source: Grispb, https://stock.adobe.com/uk/294079804, stock.adobe.com
Patents
  • Patent application filed, US20210217583
IP Status
  • Patent application submitted
Seeking
  • Licensing
  • Development partner
  • Commercial partner