Background

Extreme ultraviolet (EUV) imaging is an optical technology that enables smaller feature sizes in semiconductor chips, which pushes device performance forward. It works by first producing a pattern by exposing a reflective photomask to UV light. The UV light is then reflected onto a substrate covered by a photoresist. Applications for this process include semiconductor device fabrication. However, EUV photoresist performance remains one of the largest barriers to EUV technology implementation, because it is difficult to simultaneously meet performance targets for resolution, line width roughness (LWR) and sensitivity. For example, low concentrations of acid during imaging will yield rough lines (high LWR), but good sensitivity; while high concentrations of acid will give smoother lines, but poor sensitivity.

Technology Overview

This SUNY Polytechnic Institute technology enables the creation of a new photoresist system that consists of polymers for photoresists, and monomers for incorporation into these polymers. The polymers comprise a photoacid generator (PAG) component and at least one other component that is photolytically stable and acid-stable. The polymers can be synthesized using numerous combinations of commercially available diacid chlorides and diols. The photoacid generator is based on N-sulfoxyimides and related moieties that contain photolabile oxygen-heteroatom bonds and photolabile bonds between oxygen and aromatic carbons. The resulting photoresists improve the capabilities of extreme ultraviolet imaging by improving image resolution, line width roughness, and sensitivity.

Stage of Development

Technology Readiness Level (TRL) 3 - Experimental proof of concept.

Benefits

Simultaneously meets performance targets for:

Resolution
Line width roughness (LWR)
Sensitivity

Applications

Extreme Ultraviolet (EUV) lithography
Semiconductor device fabrication

Opportunity

This technology would be of interest to manufacturers of electronic components that use EUV fabrication, including:

Photoresist manufacturers
Semiconductor manufacturers
Electronic components and instruments manufacturers
Research institutions

Chain-Scission Polyester PAG-Polymers

Patents

IP Status

Seeking